Nano-CMOS gate dielectric engineering

Abstract

Content: Machine generated contents note: 1.Overview of CMOS Technology. 1.1.Introduction. 1.2.MOS Transistor: A Quick Introduction to Classical Models. 1.2.1.Current-Voltage Characteristics. 1.2.2.Threshold Voltage. 1.3.Short-Channel Effects and Short-Channel Modifications. 1.3.1.Effect on I-V Characteristics. 1.3.2.Subthreshold Conduction. 1.3.3.Short-Channel Effects. 1.3.3.Threshold Voltage Roll-Off. 1.3.4.Drain-Induced Barrier Lowering (DIBL). 1.3.5.Gate Leakage Current. 1.3.5.1.Direct-Tunneling. 1.3.5.2.Fowler-Nordheim Tunneling. 1.3.5.3.Poole-Frenkel Emission and Trap-Assisted Tunneling. 1.4.Features and Uniqueness of MOS Transistor. 1.5.MOS in Deca-Nanometer.