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dc.contributor.authorJackson, Wallaceen_US
dc.date.accessioned2017-07-19T03:52:34Z
dc.date.available2017-07-19T03:52:34Z
dc.date.issued2016en_US
dc.identifier.isbn1484216962en_US
dc.identifier.isbn9781484216965en_US
dc.identifier.otherHPU4161144en_US
dc.identifier.urihttps://lib.hpu.edu.vn/handle/123456789/26168
dc.description.abstractThis concise book covers concepts central to digital illustration using the Inkscape 0.91 open source software package as well as the Adobe Illustrator Professional Illustration package. The book builds on the foundational concepts of vector graphics and the SVG format, and gets more advanced as chapters progress, covering what vector new media formats are best for use with Android Studio, Java and JavaFX, iOS, Kindle and HTML5, as well as key factors regarding the data footprint optimization work process, and why data footprint optimization is important. What You Will Learn: What comprises a digital illustration 2D modeling and rendering pipeline• What are the concepts and principles behind digital illustration content production• How to install and utilize 64-bit Inkscape 0.91 for Windows, Mac OSX and Linux• What are the concepts behind Spline Curves, Strokes, Fills, Patterns and Rendering and how to use and apply them• How to understand and handle digital illustration data formats and data footprint optimization. Audience Primary: Artists, Illustrators, Website Developers, Flash Developers, User Interface Designers, Digital Signage Content Developers, e-Learning Content Creators, eBook Authors. Secondary: Android Developers, iOS Developers, Multimedia Producers, Rich Internet Application (RIA) Programmers, Game Designers, Teachers, Educators.en_US
dc.format.extent178 p.en_US
dc.format.mimetypeapplication/pdfen_US
dc.language.isoenen_US
dc.subjectMultimedia Information Systemsen_US
dc.subjectMedia Designen_US
dc.subjectDigitalen_US
dc.titleDigital Illustration Fundamentals: Vector, Raster, WaveForm, NewMedia with DICF, DAEF and ASNMFen_US
dc.typeBooken_US
dc.size16.9Mben_US
dc.departmentTechnologyen_US


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